Hello Skin Jumiso Rich Nourishment Mask is infused with powerful, moisturizing ingredients like argan oil and ceramides, ensuring that the skin looks healthy and radiant. The Jumiso mask is made from an extremely soft, thin, and breathable cupra cotton fabric, allowing it to absorb up to ten times more essence than regular cotton masks. This means a higher concentration of essence is delivered to the skin. Suitable for all skin types.
Skin type | Normal skin |
Time of care | Day, Night |
Care need | Moisturising |
Content | 26 ml |
Item number | 12009895 |
Manufacturer | Jumiso |
Category | Face masks |
Manufacturer no. | HENOMA |
Release date | 7.8.2019 |
Target group | Women |
Face mask type | Sheet mask |
Skin type | Normal skin |
Care need | Moisturising |
Time of care | Day, Night |
CO₂-Emission | |
Climate contribution |
Items per sales unit | 1 x |
Scope of delivery | 1x Jumiso Rich Nourishment Mask 26 ml |
Content | 26 ml |
Length | 18 cm |
Width | 13 cm |
Height | 0.30 cm |
Weight | 38 g |
Ingredients | Aqua/Water, Glycerin, Methylpropanediol, PEG-60 Hydrogenated Castor Oil, Betaine, Carbomer, Hydroxyethylcellulose, Xylitylglucoside, Xanthan Gum, Anhydroxylitol, Butylene Glycol, Arginine, Scutellaria Baicalensis Root Extract, Glyceryl Caprylate, Caffeine, PEG-32, Allantoin, Xylitol, Argania Spinosa Kernel Oil, Ethylhexylglycerin, Panthenol, Niacinamide, Disodium EDTA, Glucose, Sodium Starch Octenylsuccinate, Aloe Barbadensis Leaf Juice, Calcium Pantothenate, Maltodextrin, 1,2-Hexanediol, Sodium Ascorbyl Phosphate, Triethylhexanoin, Butyrospermum Parkii Butter, Tocopheryl Acetate, Pyridoxine HCl, Caprylyl Glycol, Hydrogenated Lecithin, Phenoxyethanol, Ceramide 3, Panax Ginseng Root Extract, Pueraria Lobata Root Extract, Paeonia Lactiflora Root Extract, Dioscorea Japonica Root Extract, Saccharomyces Ferment Filtrate, Lactobacillus Ferment, Ceramide 2, Silica, Chlorphenesin, Dehydroacetic Acid, Parfum, Hexyl Cinnamal, limonene, linalool. |
Instructions for use | Unfold the sheet mask and place it on the face with the protective film facing upwards. Remove the protective film and leave on for 15-20 minutes. Remove the mask and pat in the remaining essence until it is completely absorbed. |