Untersuchung der Strahlungsbeständigkeit von Ni-Nanostrukturen

This monograph is dedicated to the investigation of the influence of radiation exposure on the properties of hollow nickel-based nanostructures, whose significance stems from the great potential for the use of nickel nanostructures in various electronic applications and catalysts. The choice of medium is determined by the possible application of nanostructures in microelectronic devices, which can heat up during operation and are not protected from the external environment. The selection of nickel as the material for the production of nanostructures is based on its physical and chemical properties, as well as a wide range of practical applications that span photovoltaics, catalysis, magnetic carriers, biomedicine, and targeted drug delivery.