Intermediate Layer in the Metal-Silicon Carbide Contact

The textbook "Intermediate Layer in the Metal-Silicon Carbide Contact" by Natalja Sleptsuk offers a comprehensive examination of metal-semiconductor contacts, particularly Schottky barrier contacts. It explains how the actual electrical properties of these contacts deviate from the ideal and the role that an intermediate layer between metal and semiconductor plays in this context. The author analyzes the effects of this layer, which can lead to phenomena such as potential drop, barrier lowering, and electron tunneling. These aspects are of significant scientific interest and are considered in the context of diffusion welding technology (DW). The book is aimed at professionals and students engaged in semiconductor technology and the associated physical phenomena.